发明名称 METHOD OF MANUFACTURING REFLECTIVE MASK, AND APPARATUS OF MANUFACTURING REFLECTIVE MASK
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a reflective mask and an apparatus of manufacturing a reflective mask which allow for improvement in productivity. <P>SOLUTION: The method of manufacturing a reflective mask includes a step for forming a reflective layer on the main surface of a substrate, a step for forming an absorbing layer on the reflective layer, a step for forming a pattern region on the absorbing layer, and a step for forming a light-shielding region surrounding the pattern region on the absorbing layer and the reflective layer. In the step for forming a light-shielding region, the reflective layer is etched using a gas containing chlorine and oxygen. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012129505(A) 申请公布日期 2012.07.05
申请号 JP20110242366 申请日期 2011.11.04
申请人 SHIBAURA MECHATRONICS CORP;TOSHIBA CORP 发明人 YOSHIMORI HIROAKI;KARYU MAKOTO;MOTOKAWA KOJI;TAKAI KOSUKE;KASE YOSHIHISA
分类号 H01L21/027;G03F1/22;H01L21/3065 主分类号 H01L21/027
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