发明名称 |
METHOD OF MANUFACTURING REFLECTIVE MASK, AND APPARATUS OF MANUFACTURING REFLECTIVE MASK |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a reflective mask and an apparatus of manufacturing a reflective mask which allow for improvement in productivity. <P>SOLUTION: The method of manufacturing a reflective mask includes a step for forming a reflective layer on the main surface of a substrate, a step for forming an absorbing layer on the reflective layer, a step for forming a pattern region on the absorbing layer, and a step for forming a light-shielding region surrounding the pattern region on the absorbing layer and the reflective layer. In the step for forming a light-shielding region, the reflective layer is etched using a gas containing chlorine and oxygen. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012129505(A) |
申请公布日期 |
2012.07.05 |
申请号 |
JP20110242366 |
申请日期 |
2011.11.04 |
申请人 |
SHIBAURA MECHATRONICS CORP;TOSHIBA CORP |
发明人 |
YOSHIMORI HIROAKI;KARYU MAKOTO;MOTOKAWA KOJI;TAKAI KOSUKE;KASE YOSHIHISA |
分类号 |
H01L21/027;G03F1/22;H01L21/3065 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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