发明名称 |
External Heating of Substrate Tubes in Plasma Chemical Vapor Deposition Processes |
摘要 |
A PCVD apparatus including an insulative covering disposed to surround at least a portion of the substrate tube and provide external heating of the substrate tube during the deposition process. The insulative covering functions to capture and retain the external thermal energy created by the plasma process. As a result, the areas of the substrate tube that are removed from the current location of the plasma absorb this captured thermal energy and remain at an essentially constant temperature until the next pass of the work coil.
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申请公布号 |
US2012160167(A1) |
申请公布日期 |
2012.06.28 |
申请号 |
US20100979989 |
申请日期 |
2010.12.28 |
申请人 |
ALONZO JOHN;FLEMING JAMES;ZYDZIK GEORGE;OFS FITEL LLC |
发明人 |
ALONZO JOHN;FLEMING JAMES;ZYDZIK GEORGE |
分类号 |
C23C16/513 |
主分类号 |
C23C16/513 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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