| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a reflective mask, manufacturing method therefor and reflective mask defect correction device, capable of maintaining a transfer characteristic even after contamination cleaning, and capable of correcting a white defect satisfactorily. <P>SOLUTION: The reflective mask includes a substrate, a multilayer film formed on the substrate and an absorption layer formed on the multilayer film in a pattern shape. The reflective mask further includes a correction portion having disturbed regularity in the periodic structure of the multilayer film located at a white defect portion caused by the shortage of film thickness of the absorption layer. The absorption layer located at the white defect portion is provided from the first. <P>COPYRIGHT: (C)2012,JPO&INPIT |
