发明名称 Gate-All-Around Integrated Circuit Devices and Methods of Manufacturing the Same
摘要 Gate-all-around integrated circuit devices include first and second source/drain regions on an active area of an integrated circuit substrate. The first and second source/drain regions form p-n rectifying junctions with the active area. A channel region extends between the first and second source/drain regions. An insulated gate electrode surrounds the channel region.
申请公布号 US2012161247(A1) 申请公布日期 2012.06.28
申请号 US201213411699 申请日期 2012.03.05
申请人 YUN EUN-JUNG;LEE SUNG-YUNG;KIM MIN-SANG;KIM SUNG-MIN 发明人 YUN EUN-JUNG;LEE SUNG-YUNG;KIM MIN-SANG;KIM SUNG-MIN
分类号 H01L27/088;H01L21/336 主分类号 H01L27/088
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