CHEMICAL VAPOR DEPOSITION APPARATUS AND METHOD OF MANUFACTURING LED USING THE SAME

摘要

PURPOSE: A chemical vapor depositing apparatus and a method for manufacturing a light emitting device using the same are provided to stably maintain the flow of reactive gas by preventing deposition materials from being deposited on the ceiling of a reactive chamber. CONSTITUTION: A chamber body(10) includes a susceptor. A chamber cover(20) is opened and closed in the chamber body. A reaction space is formed between the susceptor and the chamber cover. A reactive gas supply unit(30) supplies reactive gas to the reaction space. A non-reactive gas supply unit(40) supplies non-reactive gas to the reaction space.