发明名称 NO FLOW UNDERFILL
摘要 A method for making a microelectronic assembly includes providing a microelectronic element 30 with first conductive elements and a dielectric element 50 with second conductive elements. At least some of either the first conductive elements or the second conductive elements may be conductive posts 40 and other of the first or second conductive elements may include a bond metal 10 disposed between some of the conductive posts 40. An underfill layer 60 may overly some of the first or second conductive elements. At least one of the first conductive elements may be moved towards the other of the second conductive elements so that the posts pierce the underfill layer 60 and at least deform the bond metal 10. The microelectronic element 30 and the dielectric element 50 can be heated to join them together. The height of the posts 40 above the surface may be at least forty percent of a distance between surfaces of the microelectronic element 30 and dielectric element 50.
申请公布号 WO2012061199(A3) 申请公布日期 2012.06.28
申请号 WO2011US58080 申请日期 2011.10.27
申请人 TESSERA, INC.;HABA, BELGACEM;MOHAMMED, ILYAS;CHAU, ELLIS;LEE, SANG II;DESAI, KISHOR 发明人 HABA, BELGACEM;MOHAMMED, ILYAS;CHAU, ELLIS;LEE, SANG II;DESAI, KISHOR
分类号 H01L21/56 主分类号 H01L21/56
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