发明名称 COMPOUND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a compound semiconductor device capable of further reducing occurrence of cracks in a compound semiconductor layer and to provide a method of manufacturing the same. <P>SOLUTION: A compound semiconductor device comprises: a substrate 1; an initial layer 2 formed on the substrate 1; and a core layer 3 that is formed on the initial layer 2 and contains a group III-V compound semiconductor. The initial layer 2 is formed as a layer composed of a group III element of the group III-V compound semiconductor contained in the core layer 3. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012119581(A) 申请公布日期 2012.06.21
申请号 JP20100269663 申请日期 2010.12.02
申请人 FUJITSU LTD 发明人 ISHIGURO TETSURO;YAMADA ATSUSHI
分类号 H01L21/338;H01L29/778;H01L29/812;H02M7/12 主分类号 H01L21/338
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