发明名称 |
COMPOUND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a compound semiconductor device capable of further reducing occurrence of cracks in a compound semiconductor layer and to provide a method of manufacturing the same. <P>SOLUTION: A compound semiconductor device comprises: a substrate 1; an initial layer 2 formed on the substrate 1; and a core layer 3 that is formed on the initial layer 2 and contains a group III-V compound semiconductor. The initial layer 2 is formed as a layer composed of a group III element of the group III-V compound semiconductor contained in the core layer 3. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012119581(A) |
申请公布日期 |
2012.06.21 |
申请号 |
JP20100269663 |
申请日期 |
2010.12.02 |
申请人 |
FUJITSU LTD |
发明人 |
ISHIGURO TETSURO;YAMADA ATSUSHI |
分类号 |
H01L21/338;H01L29/778;H01L29/812;H02M7/12 |
主分类号 |
H01L21/338 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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