| 摘要 |
<p>An exposure apparatus (EX) that: projects pattern (PA) images onto a substrate (W) via liquid (L) and a projection optical system (PL), the liquid (L) forming a liquid immersion region (AR2) between the projection optical system (PL) and the substrate (W); and exposes the substrate (W). The apparatus (EX) has: a liquid-supplying-section (15) that supplies the liquid (L) onto the substrate (W); a first pipe section (14a) that introduces the liquid (L) to the liquid-supplying-section (15); and a second pipe section (14b), connected to the first pipe section (14a), that collects the liquid (L) not being supplied to the liquid-supplying-section (15) from the first pipe section (14a). By doing this, it is possible to provide a liquid-immersion exposure apparatus (EX) having a liquid-supplying-mechanism, exposure method, and a method for manufacturing devices so as to: restrict the temperature of the liquid (L), supplied between the projection optical system (PL) and the substrate, from varying; and prevent contaminants from invading into the liquid (L).</p> |
