| 发明名称 |
PHOTOCURABLE RESIN COMPOSITION INCLUDING ALLYL-BASED POLYMER AND DIALLYL PHTHALATE RESIN, AND APPLICATION OF THE SAME |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photocurable resin composition that contains an allyl-based polymer and a diallyl phthalate resin and is excellent in adhesion to plastics. <P>SOLUTION: The photocurable resin composition and ink and a coating including the resin composition are provided. The photocurable resin composition can be cured by light irradiation and includes an allyl-based polymer and a diallyl phthalate resin. The allyl-based polymer is obtained by polymerizing an allyl-based compound represented by general formula (I) (CHR<SP POS="POST">1</SP>=CR<SP POS="POST">2</SP>-CH<SB POS="POST">2</SB>-O-CO)<SB POS="POST">n</SB>-A, wherein R<SP POS="POST">1</SP>and R<SP POS="POST">2</SP>each represents H or CH<SB POS="POST">3</SB>, A represents a saturated or partially unsaturated 4-8 membered ring cyclic skeleton having an alkyl substituent, and n represents 2 or 3. <P>COPYRIGHT: (C)2012,JPO&INPIT |
| 申请公布号 |
JP2012116868(A) |
申请公布日期 |
2012.06.21 |
| 申请号 |
JP20100264687 |
申请日期 |
2010.11.29 |
| 申请人 |
DAISO CO LTD |
发明人 |
EBATA HIDEAKI;MIURA KATSUTO;YOKOYAMA KATSUTOSHI;OHASHI SHINICHIRO |
| 分类号 |
C08F267/06;C08F263/06;C09D4/00;C09D5/00;C09D7/12;C09D11/00;C09D131/06;C09D131/08 |
主分类号 |
C08F267/06 |
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