Marking method of solar cell, involves forming etching mask on substrate and performing etching process, and forming raised mark structure on substrate by etching mask

摘要

The method involves providing a substrate (110) for a Solar cell. An etching mask (130) is formed on the substrate and the etching process is performed. A raised mark structure (120) is formed on the substrate by the etching mask. The removal of etching mask is performed according to etching process and by irradiating the etching mask with a laser beam. An independent claim is included for solar cell.