发明名称
摘要 <p>Disclosed herein is a laser processing method for a wafer having a plurality of regions defined by streets, with the regions having a plurality of devices formed therein. The method irradiates the wafer with a laser beam along the streets, thereby forming laser processed grooves along the streets. It includes a processed groove formation step of irradiating the wafer while positioning the beam's focus spot on an irradiation surface of the wafer, thereby forming the laser processed grooves; and a processed groove finishing step of irradiating the wafer along the laser processed grooves formed by the processed groove formation step, while positioning the focus spot beyond the bottom of the laser processed grooves, thereby finishing both sides of the laser processed grooves.</p>
申请公布号 JP4942313(B2) 申请公布日期 2012.05.30
申请号 JP20050198866 申请日期 2005.07.07
申请人 发明人
分类号 H01L21/301;B23K26/00;B23K26/06 主分类号 H01L21/301
代理机构 代理人
主权项
地址