发明名称 |
METHODS FOR MANUFACTURING PASSIVATION LAYER AND THIN FILM TRANSISTOR ARRAY SUBSTRATE |
摘要 |
The present invention provides methods for manufacturing a passivation layer and a thin film transistor (TFT) array substrate. The method for manufacturing the passivation layer comprises the following steps: placing a substrate in a vacuum process chamber; providing an ammonia gas and a nitrogen gas into the vacuum process chamber; forming plasma and evaporating water vapor; and forming the passivation layer on the substrate. The method for manufacturing the passivation layer can be applicable to the method for manufacturing the TFT array substrate. The present invention can enhance the quality of the passivation layer. |
申请公布号 |
US2012129303(A1) |
申请公布日期 |
2012.05.24 |
申请号 |
US201113219942 |
申请日期 |
2011.08.29 |
申请人 |
HE CHENGMING;LIU FENGJU;SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD. |
发明人 |
HE CHENGMING;LIU FENGJU |
分类号 |
H01L21/336 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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