Method for forming ferroelectric thin film including acid treatment,申请号KR20100025559-传众专利搜索

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发明名称	Method for forming ferroelectric thin film including acid treatment
摘要
申请公布号	KR101145667(B1)	申请公布日期	2012.05.24
申请号	KR20100025559	申请日期	2010.03.23
申请人		发明人
分类号	H01B3/10;C23C16/40;H01L21/31	主分类号	H01B3/10
代理机构		代理人
主权项
地址

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