| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure method capable of improving throughput, exposure apparatus, and a manufacturing method of a device. <P>SOLUTION: A plurality of target integral exposure amounts S are set in a plurality of shot regions S of a substrate P. Exposure is performed at movement speed V that is slower than maximum speed Vmax, of a substrate stage 2 in a scanning direction in the exposure of each shot region. In addition, at least one of an adjustable characteristic of exposure light EL in the exposure of each of the shot regions and the width of the exposure light EL of the scanning direction on the substrate P is adjusted based on the set target integral exposure amount S. <P>COPYRIGHT: (C)2012,JPO&INPIT |
