METHOD FOR CLEANING FINE PATTERN SURFACE OF MOLD, AND IMPRINTING DEVICE USING SAME

摘要

Provided are a method for cleaning a fine pattern surface of a mold, and an imprinting device. The method and the imprinting device are capable of removing foreign materials attached to fine irregular patterns of a mold without detaching the mold from a supporting device. The method for cleaning a fine pattern surface of a mold includes: applying a photo-curable resin onto the surface of a transcriptional body against which the mold is pressed, thereby forming a photo-curable resin layer; pressing the mold against the photo-curable resin that has been applied onto the surface of the transcriptional body; and curing the photo-curable resin and then separating the cured photo-curable resin from the mold, thereby removing the foreign materials attached to the surface of the fine pattern by incorporating the foreign materials into the cured photo-curable resin. The photo-curable resin is formed on the surface of the transcriptional body to have the thickness allowing removal of the foreign materials attached to the surface of the fine pattern. The mold is pressed against the photo-curable resin layer formed on the surface of the transcriptional body with the pressure allowing removal of the foreign materials attached to the surface of the fine pattern.