| 摘要 |
In an interference microscope and a measuring device for observing and inspecting the surface and inside of a specimen such as a wafer by applying laser light to the specimen and using an interferometer, a reference optical path for conducting light is provided between a beam splitter and a reference mirror, and a measurement optical path for conducting light is provided between the beam splitter and the specimen, thereby providing an optical path difference between the reference optical path and the measurement optical path. Further, the reference mirror is tilted slightly, thereby forming interference fringes on detection means. It is possible to measure the surface shape of the specimen (measurement object) such as a wafer only by slightly tilting the reference mirror with a simple configuration and locate the accurate coordinate positions of foreign particles and pole pieces. |
