| 摘要 |
PURPOSE: A substrate cleaning apparatus and method, and a storage media for substrate cleaning are provided to efficiently clean a substrate by transferring a supply place of washing solution and a discharge place of gas to a peripheral part of the substrate and promoting the drying of a dry region. CONSTITUTION: A carrier station(1) comprises a load unit(11) loading a carrier(10), an opening and closing unit(12), and a transmitting means(A1). The transmitting means takes out a wafer(W) from the carrier through the opening and closing unit. A processing unit(2) comprises a shelf units(U1, U2, U3) and liquid processing units(U4, U5). An interface unit(3) is composed of a first transfer room(3A) and a second transfer room(3B) installed between the processing unit and a light exposed unit(4). A temperature-humidity control unit(22) controls temperature and humidity of processing liquid. |
