发明名称 Procedimiento para la producción de un heterocontacto que tiene una capa amortiguadora doble
摘要 A method for producing a heterocontact, which has a double buffer layer that is free from phase shift and comprises at least ZnO, between an active chalcogenide-based semiconductor layer and a ZnO window contact layer is to be provided, which comprises no wet-chemical process steps and in particular fits in an inline production process for CIS thin-film solar arrays, while not requiring the use of CdS for the buffer layer and forms no excess CuS on the surface. The solution according to the invention provides for the production of a direct heterocontact between a chalcogenide-based semiconductor layer and a ZnO window contact layer by means of a MOMBE method, said heterocontact comprises a buffer layer made of ZnX, where X = S, Se, Te, and ZnO, made of two partial layers free from phase shift.
申请公布号 ES2380423(T3) 申请公布日期 2012.05.11
申请号 ES20080861948T 申请日期 2008.12.10
申请人 HELMHOLTZ-ZENTRUM BERLIN FUR MATERIALIEN UND ENERGIE GMBH 发明人 ANDRES, STEFAN;LEHMANN, CARSTEN;PETTENKOFER, CHRISTIAN
分类号 H01L31/18;H01L31/0749 主分类号 H01L31/18
代理机构 代理人
主权项
地址