| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition which manufactures a resist pattern to be excellent in a mask error factor (MEF). <P>SOLUTION: A resin has a structural unit derived from a compound represented by formula (I) and a resist composition contains the resin and an acid generator. (Wherein, R<SP POS="POST">1</SP>represents a 1-6C alkyl which may have a halogen atom, hydrogen atom or a halogen atom. A<SP POS="POST">1</SP>represents a 1-6C alkanediyl or the like which may have a substituent, ring X<SP POS="POST">1</SP>represents a 2-36C heterocyclic, and hydrogen atom constituting the heterocyclic may be replaced with a halogen atom, hydroxy, a 1-24C hydrocarbon, a 1-12C alkoxy, a 2-4C acyl or a 2-4C acyloxy). <P>COPYRIGHT: (C)2012,JPO&INPIT |
