发明名称 |
VAPORIZING POLYMER SPRAY DEPOSITION SYSTEM |
摘要 |
A vaporizing spray deposition device for forming a thin film includes a processing chamber, a fluid line, and a spray head coupled to the fluid line proximate the processing chamber. The fluid line is configured to transfer a polymer fluid and solvent mixture to the spray head. The spray head is configured to receive the polymer fluid and solvent mixture and to atomize the polymer fluid and solvent mixture to emit it in a substantially vaporized form to be deposited on a surface and thereby forming a thin film of the polymer on the surface after evaporation of the solvent. In an embodiment, the vaporizing spray deposition device may include a heating device to perform a hard bake process on the polymer. In an embodiment, the vaporizing spray deposition device may be configured to provide a post deposition solvent spray trim process to the thin film polymer.
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申请公布号 |
US2012108040(A1) |
申请公布日期 |
2012.05.03 |
申请号 |
US20100916704 |
申请日期 |
2010.11.01 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
CHANG CHING-YU;LU KUEI-LIANG;SHIEH MING-FENG |
分类号 |
H01L21/20;B05B1/00;B05C5/00;B05C15/00 |
主分类号 |
H01L21/20 |
代理机构 |
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主权项 |
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