发明名称 SEMICONDUCTOR SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR SUBSTRATE, AND VERTICAL-CAVITY SURFACE-EMITTING LASER
摘要 <p>Provided is a semiconductor substrate for a vertical-cavity surface-emitting laser, which comprises a p-type crystalline layer, and wherein the p-type crystalline layer is composed of a 3-5 group compound semiconductor, comprises carbon atoms as p-type impurity atoms, and comprises hydrogen atoms with a concentration of not less than 6 × 1017 cm-3 and not more than 6 × 1019 cm-3.</p>
申请公布号 WO2012056648(A1) 申请公布日期 2012.05.03
申请号 WO2011JP05822 申请日期 2011.10.18
申请人 SUMITOMO CHEMICAL COMPANY, LIMITED;ICHIKAWA, OSAMU 发明人 ICHIKAWA, OSAMU
分类号 H01S5/183;H01L21/205;H01S5/343 主分类号 H01S5/183
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