发明名称 |
SEMICONDUCTOR SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR SUBSTRATE, AND VERTICAL-CAVITY SURFACE-EMITTING LASER |
摘要 |
<p>Provided is a semiconductor substrate for a vertical-cavity surface-emitting laser, which comprises a p-type crystalline layer, and wherein the p-type crystalline layer is composed of a 3-5 group compound semiconductor, comprises carbon atoms as p-type impurity atoms, and comprises hydrogen atoms with a concentration of not less than 6 × 1017 cm-3 and not more than 6 × 1019 cm-3.</p> |
申请公布号 |
WO2012056648(A1) |
申请公布日期 |
2012.05.03 |
申请号 |
WO2011JP05822 |
申请日期 |
2011.10.18 |
申请人 |
SUMITOMO CHEMICAL COMPANY, LIMITED;ICHIKAWA, OSAMU |
发明人 |
ICHIKAWA, OSAMU |
分类号 |
H01S5/183;H01L21/205;H01S5/343 |
主分类号 |
H01S5/183 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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