发明名称 Method for producing a mould for nanostructured polymer objects
摘要 A mould for objects made of polymer material is produced by successively depositing a barrier thin layer and a thin layer of diamond-like carbon on at least a part of a metal support. The thin layer of diamond-like carbon is then nanopatterned with a predetermined pattern presenting a form factor of more than 1. Nanopatterning is performed by selective chemical etching in dry phase through a hard mask and etching stops at an interface between the thin layer of diamond-like carbon and the barrier thin layer. The hard mask used was formed beforehand on a free surface of the thin layer of diamond-like carbon by selective chemical etching in dry phase performed through a void lattice delineated by nanoparticles deposited beforehand on a free surface of said hard mask. The barrier thin layer and the nanopatterned thin layer of diamond-like carbon form a bilayer coating presenting a thickness comprised between about 100 nm and about 10 μm.
申请公布号 US8168076(B2) 申请公布日期 2012.05.01
申请号 US20090588878 申请日期 2009.10.30
申请人 GAVILLET JEROME;JULIET PIERRE;COMMISSARIAT A L'ENERGIE ATOMIQUE 发明人 GAVILLET JEROME;JULIET PIERRE
分类号 C03C15/00 主分类号 C03C15/00
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