| 摘要 |
PURPOSE: A method for extending an electrochemical surface of a niobium thin film for an electrolytic capacitor is provided to increase the capacitance of an electrolytic capacitor by electrochemically etching a niobium thin film. CONSTITUTION: A solution with hydrofluoric acid is made. The surface of a niobium thin film is electrochemically etched by anodizing the niobium thin film in the solution with the hydrofluoric acid. Wells are formed on the outer surface of the niobium thin film due to etching. An empty space is formed under the well of the outer surface and is larger than the diameter of the well. A solvent is selected from a group of C1 to C4 alcohol and C1 to C4 aqueous alcoholic solutions.
|
