| 摘要 |
FIELD: process engineering. ^ SUBSTANCE: device for vacuum evaporation for creation of metal vapor atmosphere in process chamber and attachment of metal from metal vapors to surface of processed object as well as for attachment of metal atom crystalline grains to said surface by diffusion. Proposed device comprises process furnace 11, at least, one process box 4 arranged in said furnace and heater 2 arranged in said furnace to surround process box from outside. Device incorporates evacuation means to decrease pressure in process furnace and process box to preset magnitude and to maintain it after placing process box with processed object and evaporating metal into process furnace. When heater increases temperature of processed object to preset magnitude, evaporating metal evaporates to allow metal atoms to displace to processed object surface. ^ EFFECT: simple design, decreased contamination of process chamber inner space. ^ 10 cl, 11 dwg, 1 ex |
