发明名称 LAMINATED FILM
摘要 <P>PROBLEM TO BE SOLVED: To provide a laminated film which has sufficient gas-barrier properties and sufficiently suppresses deterioration in the gas-barrier properties even when the film is bent. <P>SOLUTION: The laminated film includes a base and at least one thin film layer formed on at least one surface of the base, wherein at least one layer of the thin film layer(s) comprises silicon, oxygen and carbon, and also, in a carbon distribution curve showing the relation between the distance from the surface of the thin film layer in the film thickness direction of the layer and the ratio of the quantity of carbon atoms to the total of silicon atoms, oxygen atom and the carbon atoms, all conditions of: (i) the carbon distribution curve has the maximum value and the minimum value; (ii) the maximum value of the carbon distribution curve is &le;5at%; and (iii) at least one maximum value of &ge;1at% is present in the carbon distribution curve are satisfied. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012081631(A) 申请公布日期 2012.04.26
申请号 JP20100228915 申请日期 2010.10.08
申请人 SUMITOMO CHEMICAL CO LTD 发明人 HASEGAWA AKIRA;KURODA TOSHIYA;SANADA TAKASHI
分类号 B32B9/00;C23C16/42;C23C16/505;H01L51/50;H05B33/02;H05B33/04 主分类号 B32B9/00
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