发明名称 USING OF INTERFEROMETER AS HIGH SPEED VARIABLE ATTENUATOR
摘要 <P>PROBLEM TO BE SOLVED: To provide a variable attenuator which satisfies necessary performance conditions to be used in a sub system of a lithographic apparatus used for controlling a dose of radiation in a lithographic exposure process. <P>SOLUTION: A system and method provides a high speed variable attenuator. The attenuator can be used within a lithographic apparatus to control intensity of radiation of one or more correction pulses used to correct a dose of the radiation subsequently to an initial pulse of the radiation. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012084919(A) 申请公布日期 2012.04.26
申请号 JP20120004922 申请日期 2012.01.13
申请人 ASML NETHERLANDS BV;ASML HOLDING NV 发明人 NOORDMAN OSCAR FRANCISCUS J;KREUZER JUSTIN L;HENRI JOHANNES PETRUS VINK;TEUNIS CORNELIS VAN DEN DOOL;DANIEL PEREZ CALERO
分类号 H01L21/027;G02B5/00 主分类号 H01L21/027
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