发明名称 |
USING OF INTERFEROMETER AS HIGH SPEED VARIABLE ATTENUATOR |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a variable attenuator which satisfies necessary performance conditions to be used in a sub system of a lithographic apparatus used for controlling a dose of radiation in a lithographic exposure process. <P>SOLUTION: A system and method provides a high speed variable attenuator. The attenuator can be used within a lithographic apparatus to control intensity of radiation of one or more correction pulses used to correct a dose of the radiation subsequently to an initial pulse of the radiation. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012084919(A) |
申请公布日期 |
2012.04.26 |
申请号 |
JP20120004922 |
申请日期 |
2012.01.13 |
申请人 |
ASML NETHERLANDS BV;ASML HOLDING NV |
发明人 |
NOORDMAN OSCAR FRANCISCUS J;KREUZER JUSTIN L;HENRI JOHANNES PETRUS VINK;TEUNIS CORNELIS VAN DEN DOOL;DANIEL PEREZ CALERO |
分类号 |
H01L21/027;G02B5/00 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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