PHOTO-CURABLE NANOIMPRINT COMPOSITION, METHOD FOR FORMING PATTERN USING THE COMPOSITION, AND NANOIMPRINT REPLICA MOLD COMPRISING CURED PRODUCT OF COMPOSITION

摘要

Provided is a photo-curable nanoimprint composition that has excellent properties in terms of etching resistance, dispersibility, and productivity. In addition, the photo-curable nanoimprint composition enables easy transferring of patterns even when a mold is pressed with a relatively low pressure. The photo-curable nanoimprint composition comprises: (A) a partial hydrolysate obtained by hydrolyzing a mixture of an organic silicon compound and a silicon compound containing (meth)acrylic groups with water in the range from, by mole, 0.1 to less than 1.0 times that of the molar amount of alkoxy groups included in the mixture; (B) a polymerizable monomer containing (meth)acrylic groups; and (C) a photopolymerization initiator. In addition, a partial hydrolysate of a fluorinated silane compound and/or a metal alkoxide may be included in (A).