| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new compound to be included in a resist composition giving a pattern having excellent line edge roughness. <P>SOLUTION: There is provided, for example, a compound expressed by formula (III-2) obtained by reacting a compound expressed by formula (I-1) with a compound expressed by formula (II-2). <P>COPYRIGHT: (C)2012,JPO&INPIT |
