| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a salt for an acid generator of a resist composition capable of providing a pattern having excellent focus margin. <P>SOLUTION: The salt is represented by formula (I) (wherein Q<SP POS="POST">1</SP>and Q<SP POS="POST">2</SP>are a fluorine atom or a 1-6C perfluoroalkyl group; L<SP POS="POST">1</SP>and L<SP POS="POST">2</SP>are a 1-17C alkylene group, and -CH<SB POS="POST">2</SB>- of the alkylene group may be substituted with -O- or -CO-; a ring W<SP POS="POST">1</SP>is a 3-36C saturated hydrocarbon ring; R<SP POS="POST">2</SP>is a hydroxyl group, a 1-6C alkyl group or a 1-6C alkoxy group; a ring W<SP POS="POST">2</SP>is a 4-36C saturated hydrocarbon ring, and -CH<SB POS="POST">2</SB>- of the saturated hydrocarbon group may be substituted with -O- or -CO-, provided at least one of -CH<SB POS="POST">2</SB>- thereof is substituted with -CO-; R<SP POS="POST">3</SP>is a 1-6C alkyl group, a 1-6C alkoxy group or a 1-6C alkoxycarbonyl group; and Z<SP POS="POST">+</SP>is an organic counter ion). <P>COPYRIGHT: (C)2012,JPO&INPIT |
