| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a detoxifying device capable of accurately measuring a temperature in a combustion chamber where a waste gas is burned, and to provide a semiconductor manufacturing apparatus in which the detoxifying device is mounted to an epitaxial film deposition apparatus. <P>SOLUTION: The detoxifying device 10 for detoxifying a waste gas 2 comprises a combustion chamber 1 to burn the waste gas 2 inside and a tubular nozzle 3 disposed on the wall of the combustion chamber 1 for supplying the waste gas 2 into the combustion chamber 1. The nozzle 3 has a shape with a decreased outer diameter toward the tip while keeping a fixed inner diameter. The semiconductor manufacturing apparatus is constituted by mounting the detoxifying device on the film deposition apparatus so as to detoxify the waste gas 2 from the film deposition apparatus. <P>COPYRIGHT: (C)2012,JPO&INPIT |
