| 摘要 |
The present invention relates to an apparatus and method for manufacturing silicon nanopowder. The present invention relates to an apparatus and method for manufacturing silicon nanopowder, characterized in that the apparatus comprises: a synthesis container having a space therein; a plasma-gas-feeding part enabling plasma gas to be fed into the synthesis container; a plasma antenna supplying power in order to convert plasma gas into plasma; a plasma-gas-feeding part enabling silicon process gas to be fed into the synthesis container; a baffle having a plurality of apertures through which particles, produced by the decomposition of the silicon process gas by means of the plasma, pass; and a stage in which a substrate, on which crystalline particles are formed by combining the particles passing through the baffle, is fixed. |
