发明名称 Tunnel field effect transistor
摘要 A tunnel field effect transistor (TFET) and a method of making the same. The transistor includes a semiconductor substrate (42). The transistor also includes a gate (50) located on a major surface of the substrate (42). The transistor further includes a drain (46) of a first conductivity type. The transistor also includes a source (44) of a second conductivity type extending beneath the gate (50). The source (44) is separated from the gate (50) by a channel region (62) and a gate dielectric (20). The transistor is operable to allow charge carrier tunnelling from an inversion layer through an upper surface of the source (44).
申请公布号 EP2439777(A1) 申请公布日期 2012.04.11
申请号 EP20100187157 申请日期 2010.10.11
申请人 NXP B.V. 发明人 CURATOLA, GILBERTO;GOLUBOVIC, DUSAN;DONKERS, JOHAN;BOCCARDI, GUILLAUME;MERTENS, HANS
分类号 H01L29/739;H01L21/329 主分类号 H01L29/739
代理机构 代理人
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