发明名称 Image Sensing Device and Fabrication Thereof
摘要 An image sensing device is disclosed, including an epitaxy layer having the a conductivity type, including a first pixel area corresponding to a first incident light, a second pixel area corresponding to a second incident light, and a third pixel area corresponding to a third incident light, wherein the wavelength of the first incident light is longer than that of the second incident light and the wavelength of the second incident light is longer than that of the third incident light. A photodiode is disposed in an upper portion of the epitaxy layer, and a first deep well for reducing pixel-to-pixel talk of the image sensing device is disposed in a lower portion of the epitaxy layer in the second pixel area and the third pixel area, wherein at least a portion of the epitaxy layer in first pixel area does not include the first deep well.
申请公布号 US2012080766(A1) 申请公布日期 2012.04.05
申请号 US20100898419 申请日期 2010.10.05
申请人 CHANG CHUNG-WEI;HUANG FANG-MING;LIN CHI-SHAO;HU YU-PING;HIMAX IMAGING, INC. 发明人 CHANG CHUNG-WEI;HUANG FANG-MING;LIN CHI-SHAO;HU YU-PING
分类号 H01L27/146;H01L31/18 主分类号 H01L27/146
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