发明名称 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 A semiconductor device includes a substrate, a first single conductor, a single insulator, and a second single conductor. The substrate includes first and second regions located adjacent to each other. The first region has blind holes, each of which has an opening on a front surface of the substrate. The second region has a through hole penetrating the substrate. A width of each blind hole is less than a width of the through hole. The first single conductor is formed on the front surface of the substrate in such a manner that an inner surface of each blind hole and an inner surface of the through hole are covered with the first single conductor. The single insulator is formed on the first single conductor. The second single conductor is formed on the single insulator and electrically insulated form the first single conductor.
申请公布号 US2012080772(A1) 申请公布日期 2012.04.05
申请号 US201113246065 申请日期 2011.09.27
申请人 ASAMI KAZUSHI;KITAMURA YASUHIRO;DENSO CORPORATION 发明人 ASAMI KAZUSHI;KITAMURA YASUHIRO
分类号 H01L29/92;H01L21/02 主分类号 H01L29/92
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