| 摘要 |
PURPOSE: A method for manufacturing a reflective type polarizer is provided to form a fine metal thin film pattern with a high aspect ratio by removing a photo resist pattern and forming a metal etching mask using a lift-off method. CONSTITUTION: A metal thin film layer(202) with a first metal material and a photo resist layer are formed on the upper side of a transparent substrate(201). The photo resist layer is exposed to laser beam in order to form a photo resist pattern layer(203a). An etching mask layer(204) with a second metal material is formed to cover the exposed upper side and the lateral side of the photo resist pattern layer. The photo resist pattern layer and the etching mask layer are developed. The exposed metal thin film layer is dry-etched to form a metal thin film pattern.
|
