发明名称 Method and apparatus for conformable polishing
摘要 A multi-station polish system and process for polishing thin, flat (planar) and rigid workpieces. Workpieces are conveyed through multiple polishing stations that include a bulk material removal belt polishing station and finishing rotary polishing station. The bulk of the material is relatively quickly removed at the bulk removal station using a conformable abrasive belt and the workpiece surface is then polished to the desired finish at the finishing station using a conformable annular rotary polishing pad.
申请公布号 US8148266(B2) 申请公布日期 2012.04.03
申请号 US20100759214 申请日期 2010.04.13
申请人 EISENSTOCK GREGORY;JAIN ANURAG;CORNING INCORPORATED 发明人 EISENSTOCK GREGORY;JAIN ANURAG
分类号 B24B29/00;B24B37/04 主分类号 B24B29/00
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