发明名称 |
Method and apparatus for conformable polishing |
摘要 |
A multi-station polish system and process for polishing thin, flat (planar) and rigid workpieces. Workpieces are conveyed through multiple polishing stations that include a bulk material removal belt polishing station and finishing rotary polishing station. The bulk of the material is relatively quickly removed at the bulk removal station using a conformable abrasive belt and the workpiece surface is then polished to the desired finish at the finishing station using a conformable annular rotary polishing pad. |
申请公布号 |
US8148266(B2) |
申请公布日期 |
2012.04.03 |
申请号 |
US20100759214 |
申请日期 |
2010.04.13 |
申请人 |
EISENSTOCK GREGORY;JAIN ANURAG;CORNING INCORPORATED |
发明人 |
EISENSTOCK GREGORY;JAIN ANURAG |
分类号 |
B24B29/00;B24B37/04 |
主分类号 |
B24B29/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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