发明名称 |
SUBSTRATE POSITION DETECTION APPARATUS, FILM DEPOSITION APPARATUS EQUIPPED WITH THE SAME, AND SUBSTRATE POSITION DETECTION METHOD |
摘要 |
A substrate position detection method includes rotating the susceptor so that the substrate receiving portion is moved into an image taking area of a imaging apparatus; detecting first two position detection marks provided in the process chamber so that the first two position detection marks are within the image taking area, wherein a first perpendicular bisector of the first two position detection marks passes through a rotational center of the susceptor; detecting second two position detection marks provided in the susceptor so that the second two position detection marks can be within the image taking area, wherein a second perpendicular bisector of the second two position detection marks passes through the rotational center of the susceptor and a center of the substrate receiving portion; and determining whether the substrate receiving portion is positioned in a predetermined range in accordance with the detected first two and second two position detection marks. |
申请公布号 |
US2012075460(A1) |
申请公布日期 |
2012.03.29 |
申请号 |
US201113236700 |
申请日期 |
2011.09.20 |
申请人 |
AIKAWA KATSUYOSHI;HONMA MANABU;TOKYO ELECTRON LIMITED |
发明人 |
AIKAWA KATSUYOSHI;HONMA MANABU |
分类号 |
H01L21/66;G08B21/00;H04N7/18 |
主分类号 |
H01L21/66 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|