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发明名称
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAMINATE, AND METHOD FOR FORMING RESIST PATTERN
摘要
申请公布号
KR20120031086(A)
申请公布日期
2012.03.29
申请号
KR20127001978
申请日期
2010.07.27
申请人
ASAHI KASEI E-MATERIALS CORPORATION
发明人
NISHIZAWA GO
分类号
G03F7/031;G03F7/004;G03F7/027;H01L21/027
主分类号
G03F7/031
代理机构
代理人
主权项
地址
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