PATTERN FORMING METHOD FOR LAYER INCLUDING BLOCK COPOLYMER

摘要

PROBLEM TO BE SOLVED: To provide a pattern forming method for a layer including a block copolymer, for manufacturing a substrate having a nanostructure with flexibly designed positions and orientation on a surface of the substrate by using phase separation of the block copolymer.

SOLUTION: The pattern forming method for a layer including a block copolymer includes: a step (1) of forming a layer 2 comprising a primer by applying the primer containing a resin component having a structural unit derived from an aromatic ring-containing monomer on a substrate 1; a step (2) of forming a layer 3 containing a block copolymer having a plurality of kinds of polymers bonded thereto on the surface of the layer comprising the primer 2 and then subjecting the layer 3 containing the block copolymer to phase separation; and a step (3) of selectively removing a phase 3a comprising at least one kind in the plurality of kinds of polymers constituting the block copolymer from the layer 3 containing the block copolymer.

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