| 摘要 |
PURPOSE: A resin and a resist composition are provided to manufacture a resist pattern having excellent mask error factor(MEF). CONSTITUTION: A resin comprises a structural unit derived from a compound in chemical formula (I). In chemical formula 1, R^1 is hydrogen, halogen or C1-C6 alkyl capable of accepting halogen, A^1 is substituted or non-substituted C1-6 alkanediyl or a compound in chemical formula: (a-1): -A^10-(-X^10-A^11)_8-X^11-A^12-, and ring X^1 is C2-36 heterocyclic ring. Hydrogen in the heterocyclic ring can be substituted by halogen, hydroxy, C1-24 hydrocarbon, C1-12 alkoxy, C2-4 acyl or C2-4 acyloxy.
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