发明名称 PLASMA PROCESSING EQUIPMENT WITH A LEAKAGE CURRENT TRANSFORMER
摘要 PURPOSE: A plasma processing apparatus using a leakage current transformer are provided to simplify a structure of a plasma processing apparatus by using parts, which are easily obtained, without additional high price matching box. CONSTITUTION: A plasma processing apparatus using a leakage current transformer comprises a chamber(1), plasma generation electrodes(9,10), a gas supply unit(40), a neon transformer(60), and a variable power supply unit(70). The chamber is corresponded to a space dividing the outside and the inside of an apparatus. The chamber is connected to the gas supply unit and an exhausting unit(50). A vacuum pressure gauge(5) is connected to the chamber. A ground electrode(11) is installed in a inner lower part of the chamber. An electric resistance type hotwire(31) is connected to a heat power supply unit(30). A neon transformer(60) is used as a leakage current transformer. An ammeter and a voltmeter are connected between the variable power supply unit and the neon transformer.
申请公布号 KR20120029630(A) 申请公布日期 2012.03.27
申请号 KR20100091544 申请日期 2010.09.17
申请人 INJE UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION 发明人 LEE, JE WON
分类号 H05H1/24;H01L21/205;H01L21/3065 主分类号 H05H1/24
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