GAS LASER DEVICE AND LASER PROCESSING DEVICE

摘要

This tri-axially orthogonal gas laser device in which an optical axis of an optical resonator, the direction in which laser gas is supplied in the optical resonator, and the direction of excited laser gas discharge are all mutually orthogonal is provided with: an exciting unit (U1) containing a ventilator (8a) for supplying laser gas in a -X direction in relation to the optical axis of the optical resonator, and a discharge electrode pair (1a) positioned on the gas upstream side of the optical axis; and an exciting unit (U2) containing a ventilator (8b) for supplying laser gas in a +X direction in relation to the optical axis of the optical resonator, and a discharge electrode pair (1b) positioned on the gas upstream side of the optical axis. Each electrode in the vertically oriented electrode pairs in the discharge electrode pair (1a) and the discharge electrode pair (1b) has the same width in the gas flow direction, and a beam mode is produced when an M2 value is 1.8-3 or when the intensity distribution peak is doughnut-shaped. This configuration makes it possible to stably achieve a uniform, beneficial distribution even in the case that there is a change in a parameter such as gas flow speed, gas pressure, electrode width, and electrode position.