SUBSTRATE CARRYING MECHANISM, SUBSTRATE PROCESSING APPARATUS, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD

摘要

PURPOSE: A substrate transfer apparatus, a substrate processing apparatus, and a method for manufacturing a semiconductor device are provided to stably transfer a substrate at high speed by suppressing the degradation of a substrate maintaining force against deformation. CONSTITUTION: A transfer device transfers a substrate in a process chamber and includes a tweezer(32) and an arm. The tweezer supports the substrate. The arm moves the tweezer. The transfer device includes a planar unit and a substrate support unit(20). The substrate support unit is formed by arranging a plurality of convex parts on the surface of the planar unit on a smaller circumference than the diameter of the substrate.