发明名称 FILM FOR SEMICONDUCTOR AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a film for a semiconductor and a semiconductor device manufacturing method which can prevent chip flying during dicing and improve pickup property. <P>SOLUTION: A film 10 for a semiconductor is formed by lamination of an adhesion layer 3, a first adhesive layer 1 contacting the adhesion layer 3, and a second adhesive layer 2 contacting a face of the first adhesive layer 1 on the side opposite to the adhesion layer 3 and having adhesiveness higher than that of the first adhesive layer 1 in this order. Assuming that an average thickness of the first adhesive layer 1 is T1, a thickness of the second adhesive layer 2 is T2, T2 is 0.5-5 &mu;m and T2/T1 is 0.001-0.65. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012060038(A) 申请公布日期 2012.03.22
申请号 JP20100203754 申请日期 2010.09.10
申请人 SUMITOMO BAKELITE CO LTD 发明人 YOSHIDA MASATO
分类号 H01L21/301;B32B27/00;C09J7/02 主分类号 H01L21/301
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