POLYMER, RESIST MATERIAL CONTAINING SAME, AND METHOD FOR FORMING PATTERN USING SAME

摘要

[Problem] To provide a polymer for a resist suitable for microfabrication performed by dry exposure, immersion exposure, or double patterning, a resist material containing the polymer, and a method for forming a pattern using the resist material. [Solution] A polymer characterized by containing a repeating unit represented by general formula (1) and a repeating unit having an acid-labile group is used. In the formula (1), R1 groups each independently represent a hydrogen atom, a halogen atom, a methyl group, or a trifluoromethyl group, R2 to R9 each independently represent a hydrogen atom, a linear hydrocarbon group having 1 to 20 carbon atoms, a branched or cyclic hydrocarbon group having 3 to 20 carbon atoms, wherein some of the carbon atoms constituting the hydrocarbon groups may be replaced by oxygen atoms, two hydrogen atoms binding to the same carbon may be replaced by an oxygen atom to form =O, H of a C-H bond of the hydrocarbon may be replaced by OH to form C-OH, some or all of the hydrogen atoms constituting R2 to R9 may be replaced by fluorine atoms, or some or all of R2 to R9 are combined to form a cyclic structure, n and m represent the number of carbon atoms and are each independently an integer of 0 to 5.