发明名称 |
Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method |
摘要 |
A lithographic apparatus comprising a support configured to support a patterning device; a substrate table configured to hold a substrate; a projection system configured to project a pattern imparted to a radiation beam by the patterning device onto a target portion of the substrate; and a first multi-layer mirror and a second multi-layer mirror, the first multi-layer mirror and the second multi-layer minor being arranged along a path of the radiation beam, the first multi-layer minor and the second multi-layer mirror each having a reflectivity of at least about 50% in extreme ultra violet wavelength range, and the first multi-layer mirror configured to reduce radiation having wavelengths in a first wavelength range and the second multi-layer minor configured to reduce radiation having wavelengths in a second wavelength range different from the first wavelength range, wherein the first wavelength range and the second wavelength range are outside extreme ultra violet wavelength range. |
申请公布号 |
US8139200(B2) |
申请公布日期 |
2012.03.20 |
申请号 |
US201113028795 |
申请日期 |
2011.02.16 |
申请人 |
VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS;BAKKER LEVINUS PIETER;BANINE VADIM YEVGENYEVICH;KLUNDER DERK JAN WILFRED;ASML NETHERLANDS B.V. |
发明人 |
VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS;BAKKER LEVINUS PIETER;BANINE VADIM YEVGENYEVICH;KLUNDER DERK JAN WILFRED |
分类号 |
G03B27/54;G03B27/42 |
主分类号 |
G03B27/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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