发明名称 |
Photomask blank, photomask, and methods of manufacturing the same |
摘要 |
A photomask blank has a light-shielding film composed of at least two layers on a transparent substrate. The light-shielding film includes a light-shielding layer made of a material mainly containing tantalum nitride and further containing xenon and a front-surface antireflection layer formed on the light-shielding layer and made of a material mainly containing tantalum oxide and further containing argon. |
申请公布号 |
US8137867(B2) |
申请公布日期 |
2012.03.20 |
申请号 |
US20090394503 |
申请日期 |
2009.02.27 |
申请人 |
NOZAWA OSAMU;HOYA CORPORATION |
发明人 |
NOZAWA OSAMU |
分类号 |
G03F1/00;C23C14/06;C23C14/08;C23C14/18;C23C14/34;G03F1/50;G03F1/54;G03F1/58 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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