发明名称 |
SUBSTRATE PROCESSING APPARATUS |
摘要 |
<p>A processing apparatus for processing a substrate G includes a processing chamber for processing the substrate; a depressurizing mechanism reducing an internal pressure of the processing chamber; and a transfer mechanism disposed in the processing chamber to transfer the substrate, wherein the transfer mechanism includes: a guide member; a stage for holding the substrate; a driving member for moving the stage; and a movable member supporting the stage and moving along the guide member. The guide member and the movable member are maintained so as not to contact each other by a repulsive force of magnets.</p> |
申请公布号 |
KR20120026135(A) |
申请公布日期 |
2012.03.16 |
申请号 |
KR20127002464 |
申请日期 |
2007.11.29 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
TOBE YASUHIRO;KAWAKAMI SATORU;MATSUBAYASHI SHINJI |
分类号 |
H01L21/677;C23C16/44;F16C32/04;H01L21/683 |
主分类号 |
H01L21/677 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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