发明名称 |
PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND STORAGE MEDIUM FOR STORING PROGRAM FOR EXECUTING THE METHOD |
摘要 |
There is provided a plasma processing apparatus including a susceptor 114, having a substrate mounting portion for mounting thereon a substrate, to which a high frequency power is applied; a focus ring 210, disposed to surround the substrate mounted on the substrate mounting portion, including an outer ring 214 having a top surface higher than a top surface of the substrate and an inner ring 212 extending inwardly from the outer ring so as to allow at least a part of the inner ring to be positioned below a periphery of the substrate, the outer ring and the inner ring being formed as a single member; a dielectric ring 220 positioned between the focus ring and the susceptor; a dielectric constant varying device 250 for varying a dielectric constant of the dielectric ring. |
申请公布号 |
US2012061351(A1) |
申请公布日期 |
2012.03.15 |
申请号 |
US201113232207 |
申请日期 |
2011.09.14 |
申请人 |
OHATA MITSUNORI;KIMURA HIDETOSHI;MAEDA KIYOSHI;HIROSE JUN;HIDA TSUYOSHI;TOKYO ELECTRON LIMITED |
发明人 |
OHATA MITSUNORI;KIMURA HIDETOSHI;MAEDA KIYOSHI;HIROSE JUN;HIDA TSUYOSHI |
分类号 |
C23F1/00;C23C16/00;C23C16/458;C23C16/50;C23C16/52;C23F1/08 |
主分类号 |
C23F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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