| 摘要 |
PURPOSE: A composition for resist stripper is provided to eliminate cured/degenerated photoresist films and etching residues and to minimizing the corrosion occurrence of especially aluminum-based metal films. CONSTITUTION: A composition for resist stripper includes primary alkanol amine represented by chemical formula 1, one or more compounds selected from secondary or tertiary alkanol amine compound represented by chemical formula 2, glycol ether, a polar solvent, and an anti-corrosion agent. In chemical formula 1, the R1 is hydroxyl group substituted C1 to C10 linear or branched alkyl or hydroxyl group substituted C1 to C10 linear or branched alkoxy group substituted C1 to C10 linear or branched alkyl. In chemical formula 2, the R2 is hydroxyl group substituted C1 to C10 linear or branched alkyl or hydroxyl group substituted C1 to C10 linear or branched alkoxy group substituted C1 to C10 linear or branched alkyl; the R3 and the R4 are respectively hydrogen, C1 to C10 alkyl, hydroxyl substituted group containing C1 to C10 linear or branched alkyl, C3 to C10 cycloalkyl, or amino group substituted or non-substituted C1 to C10 alkyl group, C2 to C10 alkenyl group, carboxylic group, hydroxyl group substituted or non-substituted C1 to C10 alkoxyl group substituted C1 to C10 alkyl, C1 to C4 alkyl substituted or non-substituted amino group, phenyl group, or benzyl group; either the R3 or the R4 is not a hydrogen element. |
